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1. Blend the components in a 3: 1 ratio. 2. Apply evenly to the prepared board, for example through organza fabric. 3. Dry for 30-60 minutes in a darkened room at a temperature of 70-80 degrees. 4. Expose to UV lamp through a photomask for 2-5 minutes.
5. Develop in a photoresist development solution (soda ash)
6. Blow out the mask for 1-2 hours at a temperature of 90-120 degrees.
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Можливо дізнатись коли приблизно будуть в наявності саме двохкомпонентні маски? Здається вже давно їх немає у вас, але і не відмічено що “постачання припинено”
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